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A Novel Stripping Process of Water-Base Photoresist $60.00

A Novel Stripping Process of Water-Base Photoresist

Fall 1982

Traditionally, water-base photoresist image on the etched metal is stripped by using a solution of caustic soda at 70·-80·C. This article presents a novel idea for stripping of the same rype photoresist (fish glue and casein) that has been overlooked in the PCM industries_

Yashuhiro Ueda, Hirai Seimitsu Corporation

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