June 2008

Fabrication of Submicron Microfeatures on Metals by Using Modified Electrolytic Photoetching Techniques

This paper summarises the presentation given to delegates attending the Hong Kong PCMI meeting on 4th March 2008 and was an outcome of a one-year sabbatical (May 2007 to May 2008) by Associate Professor “Harry” Wang to study novel etching technologies with Professor David Allen and Dr. Heather Almond at Cranfield University. Introduction

Currently there is a great demand for microfabrication, especially in the fields of Aerospace, Microelectronics, Biomedicine, Automobiles and Communications. The typical methods used for microfabrication are shown in Table 1.

Dr. Wei Wong, Nanjing University of Aeronautics and Astronautics, China and Prof. David Allen and Dr. Heather Almond, Cranfield University, UK