New Aqueous Dry Film Photoresist for Photochemical Machining App

Winter 1992

New Aqueous Dry Film Photoresist for Photochemical Machining Applications

This paper provides an overview of our R&D effort in developing a Dry Film Photoresist for photochemical machining applications. Product performance date and customer production evaluations confirm the benefits of this state of the art Dry Film Photoresist Technology.

Les Moyer, Dynachem Electronic Materials