Optimizing Dry Film Photoresist Lamination

Winter 1990

Optimizing Dry Film Photoresist Lamination

As the density of a printed circuit board increases, circuit line defects that were only viewed as slight irregularities with coarser boards, become functional problems which can lead to decrease in manufacturing yields. The defects on etched innerlayers include open and nicked circuits. These defects can be caused by interfacial voids: tiny pockets of air which become trapped between the copper foil and the dry film photoresist during lamination. Modifying the lamination pressure, speed, or roll temperature, increasing the dry film thickness, or preheating the boards can eliminate or greatly reduce the yield losses encountered when manufacturing fine line innerlayers.

Brian Grundy, DuPont Electronics, Ltd., UK