Publications

September 2001

A Comparative Performance of Test Dry Film Photoresists on Stainless Steel

The objective of this study was to determine and quantify dry film photoresist performance differences in a photochemical machining application under standard processing conditions.

A Comparison of Analytical Procedures of Ferric Chloride Etching Solution

Spring 1986

The purpose of this exercise is to standardize the techniques

that are used to analyze ferric chloride etching solutions and to

reach a common ground for discussing the properties of etching

solutions and their relationship to the etching process.

Fall 1996

A Comparison of PCMI Southern California Chapter Members

The controversi~”Metal Products and Machinery”

(MP&M) effluent proposals are the result of a lawsuit

filed by the NatiOjal Reserve Defense Council and

Public Citizen, Inc.

Winter 1998

A High Resolution, Positive Working Dry Film Photoresist

Abstract

A positive work” g dry film photoresist designed

for either acid etch r electroplating applications is

presented.

Summer 1997

A New Etch Resist for Photochemical Machining

TECAN, a mid-size photo chemical machining and

electro-forming company in Southern England, was

looking to replace their cyclic poly-isoprene based resist

with a photo resist, which allows aqueous developing

and stripping.

2010
 
D M Allen, M Simpkins and H Almond
 

A novel photochemical machining process for magnesium aerospace and biomedical microengineering applications

Research was carried out to evaluate the feasibility of fabricating perforated (filigree) magnesium microcomponents with metal wire widths of the order of the metal thickness using a photochemical machining (PCM) process.

June 2001

A Process to Measure the Resolution Capabilities of PCB Imaging Equipment

1be use oCne\’ imaging equipment in

conjunction with older machines can cause

confusion within the imaging department

regarding the firm’s ability to resolve fine lines.

Spring/Summer

1995

A Range of New Environmentally Friendly Electrophoretic Coating Processes

Regulations afound the wocld are becoming increasingly

stringent regarding the use of toxic materials and

those regulating what materials can be introduced into

environment by industrial processes.

Spring 1990

A Supplier’s View of Ferric Chloride Etchants

The 1980s saw the end of ferric chloride as a significant

etchant in the printed circuit industry. The PCM industry

remains reliant on ferric chloride for the majority of its etching

requirements.

Dec 2009

A SWOT Analysis of Photochemical Machining (PCM) and Photoelectroforming (PEF)

Management of business activities is complex, but fundamental to success. One business tool that can help

organisations to focus on its aims and objectives is an analysis of its Strengths, Weaknesses, Opportunities and

Threats (SWOT).

June 2007

A Technical and Economic Comparison of the Photochemical Machining of AISI 304 and AISI 201 Stainless Steels With Ferric Chloride Etchants

INTRODUCTION

The retail price of alloys is dependent on the market prices

of the individual metals in the alloy.

Acid Copper Plating for Electronics

Winter 1983

Now that we have gone through a typical process, let me

talk about two benefits from it that we are all interested in.

Acid Copper Plating for Electronics

Winter 1983

Now that we have gone through a typical process, let me

talk about two benefits from it that we are all interested in.

September 2004

Advanced Chemical Process Control Chemical Sensors and Automatic Analysis: Part Two

(This article is a continuation ofan article that

appeared in the PCMI Journal in June 2004.)

INTERMEDIATE DEVICES &

June 2004

Advanced Chemical Process Control Chemical Sensors and Automatic Analysis: Part One

I don t have to tell anybody that times are tough!

In addition, when they re tough like this, you

don t like to waste the money you have earned-it

came dearly!

Spring 1998

Advancements in Exposure, Registration and Productivity

Our industry demands improved quality with higher productivity to meet competitive pressure. It is not a choice but a matter

of survival.

Fall 1988

Advances in Dry Film Resists

Since solvent dry film resist was first introduced in 1968, the

demands on dry films have been ever increasing. Initially the

demands were chemical, leading to the introduction of aqueous

and semi-aqueous films;

March 2009

Advances in Manufacturing Process Involving Photolithography: A Review of Recent Developments Worldwide

While well-established PCM and PEF processes are the primary concerns of the PCMI membership,

there are many new and novel processes and applications being derived as manufacturing demands

increase.

December

2003

Advances in Wastewater Treatment

Photo Chemical Machining (PCM) is a

manufacturing process that plays a key role in the

production of countless precision and decorative

parts, such as circuitry components, heat sinks,

optical attenuators.

September 2000

Alternatives to Contact Printing

When we think of alternatives to contact (or

proximity) printing, laser direct imaging (LOI)

comes to mind. However. there are many

alternative approaches being looked at.

March 2002

An Efficient Method for Nickel Removal from Iron Chloride Solutions Ferric chloride solution is widely used in the photochemical machining (peM) industry for etching nickel-eomaining alloys and stainless steels.

An Eye to the Future: An Open Letter

Summer 1984

In the last ‘Letter from the Presiden!,!l) Chet Poplaski referred

to Bill Lehrer’s vision of 1990 with “continuous (PCM) lines

competing with stamping machines”.

An Intense Examination of the Second Phase of the Round Robin Test Program

Fall 1984

EDITOR’S NOTE:

[ssUE NO. 10, FALL 1982 of THE JOURNAL has the ROUND

ROB[N Test Results.

An Update on Applying Photo Chemical Machining

January 1981

Photo chemical machining can increase the product designer’s chances for achieving personal on-the-job success…phot chemical machining can help corporations improve their competitveness in the marketplace;

Dec. 1999

Application of Machine Vision in Photo Chemical Machining. Part Two: Applying Machine Vision: An Integrator’s View

A machine vision system integrator views the

world differently than a component manufacturer.

Sept .1999

Application of Machine Vision in Photo Chemical Machining. Part One: Machine Vision Equipment, A Manufacturer’s View

Machine vision is a pragmatic business.

It is about making money by improving production

processes.

Winter 1998

Aqueous Resist Development Considerations for Fine Feature Resist Image Formation

Introduction

Dry film aqueous processable photoresists are used to

define etched features in a variety of metals in the Photochemical

Machining industry.

Aspects of the Present Status of PCMI in Japan

Fall 1983

My subject is “ASPECTS OF THE PRESENT STATUS

OF reM IN JAPAN”. I obtained information on this

subject through a questionnaire from a number of

related companies in JAPAN.

Assessment of Three Methods Supplied by the PCMI, for the Determination of Free Hydrochloric Acid Content in Ferric Chloride Etching Solutions

Spring 1986

Hugh McCallion, Photofabrication (Svs.) Ltd.

Spring 1983

Automated Semi- and Fully Aqueous Photoresist Stripping Systems

I would like to trace the role of photoresist as it has

emerged throughout the years and its pivotal role in the

creation oflhe PCM industry.