Development of Dry Film Photoresist Webinar Recording

Published: November 29, 2023
Type of Resource: Webinar Recording
Presented by: Prof David Allen, Emeritus Professor of Microengineering, Cranfield University, UK

Abstract:
Exposure of a photoresist to UV/visible radiation causes photochemical reactions to occur in its chemical composition. In a negative-working photoresist, the resultant higher molecular weight photoproduct results in lower solubility. Thus, the unexposed areas of the photoresist can be dissolved in a suitable chemical solution (developer) much faster than the exposed areas of the photoresist. This post-exposure solubility difference is exploited in the development process to create apertures in a resist stencil.

This webinar covers monitoring and control of exposure variables, developer composition, and development time in a conveyorized spray developer system to produce the optimum aperture profile in a resist stencil that adheres strongly to a metal foil prior to etching.