Photo Resists in Photo Chemical Machining Applications

The purpose of this PCMI Technical Manual is to make information available to users and designers of Photo Chemical Machined Parts. The manual contains a compilation of valuable and useful data pertinent to the problems encountered in the application of photo chemical machinery principles.

The data is reviewed and edited by many industry experts, and the decision to publish the material is by approval of the PCMI Board of Directors.

The content of this booklet was updated by the PCMI Education Committee.

The original work was compiled by the following people:

• Emeritus Professor David Allen
• Ken Bridges
• M. Lane Hilland
• Wes Pittenger
• Rudy Sedlak
• Ken Switzer
• Heimeran Von Stauffenberg