Summer 1997
A New Etch Resist for Photochemical Machining
TECAN, a mid-size photo chemical machining and
electro-forming company in Southern England, was
looking to replace their cyclic poly-isoprene based resist
with a photo resist, which allows aqueous developing
and stripping. The decision was driven by
environmental concerns, since the current resist contains
a non-desirable carrier solvent. Furthermore it
was the objective to conveyorize the developing and
take advantage of an improved process flow and
faster turnaround.
Collin Bird, TECAN Components, Ltd. and Diethard Kapp-Schwoerer, HTP AG
