Continuous Cleaning of Metallic Strip for Photochemical Etching

Winter 1997

Continuous Cleaning of Metallic Strip for Photochemical Etching

BMC Industries, Mask Operations, deans and photochemically etches approximately 21×10 6 square meters of surface area in its continuous, aperture mask manufacturing process. A brief discussion will be presented on the overall process focusing on substrate contaminants and their removal in preparation for photoresist application.

Dr. Kenneth Abate, BMC Industries