Winter 1997
Continuous Cleaning of Metallic Strip for Photochemical Etching
BMC Industries, Mask Operations, deans and photochemically
etches approximately 21×10 6 square
meters of surface area in its continuous, aperture mask
manufacturing process. A brief discussion will be presented
on the overall process focusing on substrate
contaminants and their removal in preparation for
photoresist application.
Dr. Kenneth Abate, BMC Industries
