March 2005
Directly Printed Etchmask
Patterning Technologies Limited has developed
its patented etch masking technology for use in
many different applications including photochemical
machining. printed circuit boards, die
cut tooling. and displays. 1be technology
enables reduction of both cost and time by
eliminating the steps ofphotolithography
currently employed in preparing the surfaces to
be etched. Improvements have been made in
achievable resolution down to J00 microns
today, with 50 microns being achievable in the
foreseeable future. The cured etch mask fluid
bas been demonstrated to withstand the
conditions ofetching for up to 2 hours. PTL is
able to offer a complete process including
equipment and fluid tailored to specific
requirements.
