Spring 1990
Electrophoretic Photoresist for Chemical Machining
During the last 30 years, resists supplied to the etching and
plating industries have been both evolutionary and revolutionary.
Initially the commercial products used were the solvent
negative working liquid resist lacquers and the positive working
novolaks. The negative resists could be characterized as very
resistant to corrosive processing but used volatile solvents and
dyes throughout the process. Resolution and performance were
somewhat hindered by solvent swelling of developed images and
removal from delicate foils was sometimes difficult.
M. Harris, Shipley Company, Inc.
