Liquid Resists for Photo Chemical Machining

March 2004

Liquid Resists for Photo Chemical Machining

This article focuses on liquid photoimagable etch resists for the production of functional or decorative metal parts. Since its beginning. the PCM industry has used liquid resists in the patterning process ofmetal sheets.

In the following the chemical nature ofthe different resist types is described and characterized in respect to their benefits for this particular application. In addition. an overview on the various application methods is given.

Diethard Kapp-Schwoerer, Dr. Kurt Meier, and Charles Gantner, HTP HiTech Photopolymere AG