March 2004
Liquid Resists for Photo Chemical Machining
This article focuses on liquid photoimagable
etch resists for the production of functional or
decorative metal parts. Since its beginning. the
PCM industry has used liquid resists in the
patterning process ofmetal sheets.
In the following the chemical nature ofthe
different resist types is described and
characterized in respect to their benefits for this
particular application. In addition. an overview
on the various application methods is given.
Diethard Kapp-Schwoerer, Dr. Kurt Meier, and Charles Gantner, HTP HiTech Photopolymere AG
