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The Use and Application of Photo Resist in PCM; Panel Discussion

The Use and Application of Photo Resist in PCM; Panel Discussion

Winter 1985

J. Kenworthy, Precision Art Coordinators (Moderator)

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Journal 2014 December

The Selection of an Appropriate Method to Manufacture Thin Sheet

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Tel: (508) 385-0085
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Email: cflaherty@pcmi.org

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PCMI

2 months ago

The weather is warming up, the days are getting brighter, and we are getting geared up for our Spring International Technical Conference! 🤓Will you be joining us in #Birmingham? 🇬🇧#PCMI #PhotoChemicalMachiningInstitute #PCM #PhotochemicalMachining #TechnicalConference #International #England #UK ... See MoreSee Less

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PCMI

8 months ago

Wonderful ambiance, great food, and even better company! PCMI thoroughly enjoyed our Group Dinner at the Hilton Phoenix Resort at the Peak on the Fountain Terrace. It was a beautiful night and a great way to wrap up Day ✌️!We are onto our last and final day of the Fall Technical Conference!#PCMI #PhotochemicalMachiningInstitute #PCM #TechnicalConference #Conference #Phoenix #Arizona #PHX #AZ ... See MoreSee Less

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PCMI

8 months ago

Thank you for traveling across the globe to present to our Conference Attendees this morning, Tobias Wiegandt! Your presentation on Zapp Precision Metals GmbH's Case Studies using MicroEtch and SuperEtch was informative. ⚙️#PCMI #PhotochemicalMachiningInstitute #PCM #TechnicalConference #Conference #Phoenix #Arizona #PHX #AZ ... See MoreSee Less

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