A Novel Stripping Process of Water Base Photoresist

Traditionally, water-base photoresist image on the etched metal is stripped by using a solution of caustic soda at 70° – 80° C. This article presents a novel idea for stripping of the same type of photoresist (fish glue and casein) that has been overlooked in the PCM industries. We can apply this method without any sophisticated mod­ification of the present facilities in the laboratory-type production system and large quantity reel to reel produc­tion line. People who have very prime knowledge about electrol­ysis can easily understand the principle of this new process. The observation of a visible


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