![The Use and Application of Photo Resist in PCM; Panel Discussion](https://pcmi.org/wp-content/uploads/2023/09/PCMI-Cover-Papers237-1.png)
Continuous Cleaning of Metallic Strip for Photochemical Etching
BMC Industries, Mask Operations, deans and photochemically etches approximately 21×10 6 square meters of surface area in its continuous, aperture mask manufacturing process. A brief discussion will be presented on the overall process focusing on substrate contaminants and their removal in preparation for photoresist application.
$60.00