Electrophoretic Photoresist for Chemical Machining

During the last 30 years, resists supplied to the etching and plating industries have been both evolutionary and revolutionary. Initially the commercial products used were the solvent negative working liquid resist lacquers and the positive working novolaks. The negative resists could be characterized as very resistant to corrosive processing but used volatile solvents and dyes throughout the process. Resolution and performance were somewhat hindered by solvent swelling of developed images and removal from delicate foils was sometimes difficult.


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