High Resolution Dry Film

Since the introduction of dry film photoresist in 1970, manufacturers who have used this technology have requested many enhancements to the product and process. The first major enhancement was the introduction in 1970 of aqueous processable dry films. This technology, which was introduced by Dynachem, today offers many cost savings to manufacturers. Throughout the last 15 years, manufacturers have asked for a dry film photoresist that more accurately reproduce ultra fine line artwork. Today a product is available to meet this need.