Part 2: The Role of Photoresists in PCM

Description

“Essentials of Photochemical Machining”

presented by: David Allen, BSc, PhD, DSc, FCIRP | Emeritus Professor of Microengineering, Cranfield University, UK

• What to Expect: Part 2
  • Photoresist Development Variables and Control
    • Break-point (dwell time in a conveyorized developer chamber)
    • Temperature
    • Chemistry
    • Dry film type and thickness
    • Spray pattern and pressure
    • Rinsing and drying