A New Etch Resist for Photochemical Machining

TECAN, a mid-size photo chemical machining and electro-forming company in Southern England, was looking to replace their cyclic poly-isoprene based resist with a photo resist, which allows aqueous developing and stripping. The decision was driven by environmental concerns, since the current resist contains a non-desirable carrier solvent. Furthermore it was the objective to conveyorize the developing and take advantage of an improved process flow and faster turnaround.